High Flux and Low Fouling Nanofibrous Ultrafiltration Membranes


Ultrafiltration (UF) is a method for separating dissolved molecules in a solution; it's used for water purification. Current UF technology employs ceramic micro-filters; the problems with these include high fouling rates and high costs. These problems result from characteristics such as the membrane surface, surface-to-volume ratio, flow rate, etc. Polymeric membranes are being studied as a replacement; they are commercially available, but currently have disadvantages. They have a tendency to clog, fiber breakage, and are more susceptible to chemical and biological attack. There is a need for improved UF system filters that are less expensive and have lower fouling rates with higher flux rates.


This filtration device is a substrate comprising a scaffold made of nanofibers with diameters from about 1 to 20,000 nanometers. The substrate is coated with a combination of a polymer and at least one nanofiller with a diameter from about 0.3 to 300 nanometers. The coating thickness ranges from 1 to 4,000 nanometers. Also, a scaffold layer is present; it's a nanofibrous scaffold layer with a top and bottom surface. The bottom surface has a greater diameter (about 300 to 10,000 nm) than that of the top surface (about 10 to 500 nm).


-Improved filters for use in filtration systems -Less expensive -Lower fouling rates -Higher flux rates


Suitable for microfiltration, ultrafiltration, and nanofiltration membranes

Patent Status


Stage Of Development


Licensing Potential

Licensing,Commercial partner,Development partner,Seeking investment

Licensing Status

Available for licensing.

Additional Info


https://stonybrook.technologypublisher.com/files/sites/aqxfhgxmrvqkq0segabl_paper_micrograph_dark.png Please note, header image is purely illustrative. Source: Zephyris, Wikimedia commons, CC BY-SA 3.0.
Patent Information:
Case ID: R7760
For Information, Contact:
Donna Tumminello
Assistant Director
State University of New York at Stony Brook
Benjamin Chu
KwangSok Kim
Benjamin Hsiao
Dufei Fang