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Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography

050-9075 Dew Point Meter Based on Graphene Oxide Film Metal-containing nanocomposite lithography resists with enhanced properties for high-performance and cost-effective lithography patterning Background: Lithography-based patterning has been instrumental in achieving the tremendous computational power and high device density possessed by today's...

Published: 8/14/2026 | Updated: 8/14/2026 | Inventor(s): Ashwanth Subramanian, Chang-Yong Nam, Jiyoung Kim, Aaron Stein, Nikhil Tiwale, Su Min Hwang, Lu Ming

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Category(s): Campus > Stony Brook University